The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2000
Filed:
May. 06, 1998
Takaaki Niinomi, Yokohama, JP;
Jun Fujita, Yokohama, JP;
Toshiyuki Urano, Yokohama, JP;
Etsuko Hino, Yokohama, JP;
Toshiaki Yokoo, Yokohama, JP;
Mitsubishi Chemical Corporation, Tokyo, JP;
Abstract
A radiation sensitive composition comprising a film-forming resin and a bis(sulfonyl)diazomethane compound of the following formula (1) or (2): ##STR1## wherein each of R.sup.1 and R.sup.3 is a linear, branched or cyclic alkyl group which may be substituted, R.sup.2 is a halogen atom, an alkoxy group which may be substituted, a nitro group, a cyano group, a nitrile group or an amide group, and each of R.sup.4, R.sup.5 and R.sup.6 which are independent of one another, is a linear, branched or cyclic alkyl group which may be substituted, a halogen atom, an alkoxy group which may be substituted, a nitro group, a cyano group, a nitrile group or an amide group.