Seongnam, South Korea

Jun-Eun Lee

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Oci Company Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jun-Eun Lee. Retrieved from https://idiyas.com/inventor/jun-eun-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Innovations of Jun-Eun Lee in Semiconductor Technology

Introduction

Jun-Eun Lee is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of semiconductor technology. His innovative work focuses on improving etching solutions for silicon substrates, which is crucial for the manufacturing of semiconductor devices.

Latest Patents

Jun-Eun Lee holds a patent for an etching solution for silicon substrates. This patent, titled "Etching solution for silicon substrate and method for manufacturing semiconductor device using the same," discloses a method that adjusts the concentration of a silane compound in the etching solution. This adjustment enhances the etching selectivity of silicon nitride films relative to silicon oxide films during the etching process. He has 1 patent to his name.

Career Highlights

Jun-Eun Lee is currently employed at OCI Company Ltd., where he continues to develop innovative solutions in semiconductor manufacturing. His work is instrumental in advancing the efficiency and effectiveness of semiconductor devices.

Collaborations

He collaborates with talented coworkers, including Ho-Seong Yoo and Myung-Hyun Kim, who contribute to the research and development efforts at OCI Company Ltd.

Conclusion

Jun-Eun Lee's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work is vital for the ongoing development of efficient semiconductor manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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