The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2021
Filed:
Jan. 22, 2020
Applicant:
Oci Company Ltd., Seoul, KR;
Inventors:
Ho-Seong Yoo, Seongnam-si, KR;
Myung-Hyun Kim, Seongnam-si, KR;
Jun-Eun Lee, Seongnam-si, KR;
Pyong-Hwa Jang, Seongnam-si, KR;
Assignee:
OCI COMPANY LTD., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K 13/06 (2006.01); H01L 21/465 (2006.01); C09K 13/06 (2006.01);
U.S. Cl.
CPC ...
C09K 13/06 (2013.01); H01L 21/465 (2013.01);
Abstract
Disclosed is an etching solution for a silicon substrate. More specifically, an etching solution for a silicon substrate is disclosed in which a concentration of a silane compound (silicon) in the etching solution for the silicon substrate is adjusted to improve an etching selectivity of a silicon nitride film relative to a silicon oxide film during etching of the nitride film.