Seongnam, South Korea

Ho-Seong Yoo

This inventor holds 1 USPTO granted patent. Top assignee: Oci Company Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ho-Seong Yoo. Retrieved from https://idiyas.com/inventor/ho-seong-yoo-r1bvxetr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: The Innovations of Ho-Seong Yoo

Introduction

Ho-Seong Yoo is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing. His innovative work has led to the development of a unique etching solution that enhances the efficiency of semiconductor devices.

Latest Patents

Ho-Seong Yoo holds a patent for an etching solution for silicon substrates. This patent, titled "Etching solution for silicon substrate and method for manufacturing semiconductor device using the same," focuses on improving the etching selectivity of silicon nitride films relative to silicon oxide films. The solution adjusts the concentration of a silane compound to achieve better results during the etching process.

Career Highlights

Yoo is currently employed at OCI Company Ltd., where he continues to advance his research and development efforts in semiconductor technology. His work is pivotal in enhancing the manufacturing processes of semiconductor devices, which are essential in various electronic applications.

Collaborations

Some of his notable coworkers include Myung-Hyun Kim and Jun-Eun Lee. Their collaborative efforts contribute to the innovative environment at OCI Company Ltd.

Conclusion

Ho-Seong Yoo's contributions to semiconductor technology through his patent and work at OCI Company Ltd. highlight his role as an influential inventor in the field. His innovative etching solution represents a significant advancement in semiconductor manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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