Company Filing History:
Years Active: 2002-2011
Title: Innovations by Julian Hsieh in Semiconductor Technology
Introduction
Julian Hsieh is a notable inventor based in Pleasanton, CA, who has made significant contributions to the field of semiconductor technology. With a total of three patents to his name, Hsieh's work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Hsieh's latest patents include innovative methods for forming moisture barriers for low K film integration with anti-reflective layers. One of his key inventions involves a nitrogen-free anti-reflective layer designed for use in semiconductor photolithography. This layer is fabricated through a chemical vapor deposition process, which may be plasma-enhanced, utilizing a gaseous mixture of carbon, silicon, and oxygen sources. By adjusting the process parameters, Hsieh achieves a substantially hermetic layer with acceptable values of the refractive index n and extinction coefficient k. The nitrogen-free moisture barrier anti-reflective layer produced by this technique significantly improves plasma etching of features such as vias in subsequent processing steps.
Career Highlights
Julian Hsieh is currently employed at Novellus Systems Incorporated, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing advanced materials and processes that enhance the performance of semiconductor devices.
Collaborations
Hsieh has collaborated with several talented individuals in his field, including Ming Chu Li and Bart Jan Van Schravendijk. These collaborations have contributed to the advancement of innovative solutions in semiconductor manufacturing.
Conclusion
Julian Hsieh's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the industry. His innovative approaches continue to shape the future of semiconductor manufacturing processes.