San Jose, CA, United States of America

Julia S Svirchevski


Average Co-Inventor Count = 3.0

ph-index = 6

Forward Citations = 78(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2000 - 2010)
  • San Jose, CA (US) (2001 - 2012)

Company Filing History:


Years Active: 2000-2012

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12 patents (USPTO):Explore Patents

Title: Innovations of Julia S Svirchevski

Introduction

Julia S Svirchevski is a prominent inventor based in San Jose, California. She has made significant contributions to the field of semiconductor processing, holding a total of 12 patents. Her work focuses on enhancing the efficiency and effectiveness of substrate processing techniques.

Latest Patents

One of her latest patents is a "Single wafer apparatus for drying semiconductor substrates using an inert gas air-knife." This innovative apparatus includes a mechanism for forming a meniscus on a substrate's surface and utilizes an air knife to shorten the meniscus. Additionally, it features a drying vapor nozzle that directs vapor to the shortened meniscus, improving the drying process. Another notable patent is for "Pad-assisted electropolishing." This method involves anodic dissolution of metal on a substrate while simultaneously buffing another portion with a pad. The process includes forming a thin liquid layer of electropolishing liquid and allows for efficient mechanical buffing of the substrate.

Career Highlights

Julia has worked with leading companies in the semiconductor industry, including Lam Research Corporation and Applied Materials, Inc. Her experience in these organizations has contributed to her expertise in substrate processing technologies.

Collaborations

Julia has collaborated with talented individuals such as Katrina Mikhaylich and Tanlin K Dickey, further enhancing her innovative work in the field.

Conclusion

Julia S Svirchevski's contributions to semiconductor processing through her patents and collaborations highlight her role as a leading inventor in the industry. Her innovative approaches continue to influence advancements in technology.

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