Juin-Jie Chang is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 5 patents. His work focuses on improving processes and technologies that enhance the efficiency and reliability of semiconductor devices.

Latest Patents

One of his latest patents is for an RTA chamber with an in situ reflective index monitor. This rapid thermal anneal (RTA) chamber features multiple openings in its wall and a reflective index monitor that measures the infrared reflective index of the reflector plate. The monitor sends signals to a process controller or an alarm, ensuring that any deviation in the reflective index triggers an immediate response to prevent damage to semiconductor wafers. Another significant patent involves a method for cleaning a silicon-based substrate without NH4OH vapor damage. This innovative method allows for the cleaning of silicon surfaces in an ammonia-containing solution while preventing surface damage, such as the formation of silicon holes.

Career Highlights

Juin-Jie Chang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work has been instrumental in advancing semiconductor technologies, making him a valuable asset in the industry.

Collaborations

He has collaborated with notable coworkers, including Shih-Chi Lin and Yen-Ming Chen, contributing to various projects that enhance semiconductor manufacturing processes.

Conclusion

Juin-Jie Chang's innovative patents and contributions to the semiconductor industry highlight his expertise and commitment to advancing technology. His work continues to influence the field, ensuring the reliability and efficiency of semiconductor devices.

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