Company Filing History:
Years Active: 2021-2024
Title: Innovations of Jui-Chieh Chen in Photomask Technology
Introduction
Jui-Chieh Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photomask technology, holding a total of four patents. His work focuses on methods to reduce particulate contamination, which is crucial for the semiconductor manufacturing process.
Latest Patents
One of Jui-Chieh Chen's latest patents is titled "Methods and systems for reducing particulate deposition on photomask." This invention addresses the issue of particulate deposition rates on photolithographic masks, particularly concerning tin (Sn) particles produced within an EUV light source. The method involves creating turbulence within the radiation source chamber of the EUV light source by adjusting temperature, pressure, and gas flow rates. This turbulence effectively reduces the number of particles that could potentially deposit on the photomask.
Another significant patent is the "Operating method for preventing photomask particulate contamination." This method secures a photomask on the bottom surface of an electrostatic chuck. It generates a first voltage at the peripheral area of the chuck to attract particles, followed by a second voltage to repulse them. Finally, a third voltage is generated near the sidewall of the photomask to attract the repulsed particles, ensuring the photomask remains uncontaminated.
Career Highlights
Jui-Chieh Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative approaches have contributed to advancements in photomask technology, enhancing the efficiency and reliability of semiconductor manufacturing processes.
Collaborations
Jui-Chieh Chen has collaborated with several talented individuals in his field, including Chih-Tsung Shih and Tsung-Chuan Lee. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Jui-Chieh Chen's contributions to photomask technology through his innovative patents demonstrate his commitment to advancing the semiconductor industry. His work not only addresses critical challenges but also paves the way for future innovations in the field.