Company Filing History:
Years Active: 2022
Title: Jueyang Liu: Innovator in Semiconductor Technology
Introduction
Jueyang Liu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on advanced manufacturing methods that enhance the performance and efficiency of semiconductor devices.
Latest Patents
Jueyang Liu's latest patents include a manufacturing method for a fin field-effect transistor. This innovative method involves forming a fin structure and a gate structure on a substrate, followed by the creation of a source-drain region that includes an epitaxial layer. The process also incorporates a sacrificial layer to protect the epitaxial layer during subsequent removal steps. Another notable patent is an epitaxial growth process for semiconductor devices, which details the formation of Dummy Gate structures and grooves in a self-aligned manner. This process optimizes the growth of crystal faces, resulting in improved semiconductor performance.
Career Highlights
Jueyang Liu is currently employed at Shanghai Huali Integrated Circuit Corporation, where he continues to push the boundaries of semiconductor technology. His expertise in manufacturing methods has positioned him as a key player in the industry, contributing to advancements that benefit various applications.
Collaborations
Jueyang Liu collaborates with talented coworkers, including Huojin Tu and Zhanyuan Hu. Together, they work on innovative projects that aim to revolutionize semiconductor manufacturing processes.
Conclusion
Jueyang Liu's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as an influential inventor in the field. His work continues to pave the way for advancements in semiconductor devices, showcasing the importance of innovation in technology.