Juei-kuo Wu

Title: Juei-kuo Wu: Innovator in Integrated Circuit Fabrication

Introduction

Juei-kuo Wu is a notable inventor based in Hsin-Chuang, Taiwan. He has made significant contributions to the field of integrated circuit (IC) fabrication. His innovative methods have the potential to enhance the performance and efficiency of electronic devices.

Latest Patents

Juei-kuo Wu holds a patent for a method of fabricating a conductive plug with a low junction resistance in an integrated circuit. This patent addresses the challenges associated with traditional IC fabrication methods. The innovative approach includes a preliminary doping process that forms a doped region in the exposed area through the contact opening or via opening. This technique effectively reduces the junction resistance of the resulting contact or via plug, improving the overall performance of integrated circuits.

Career Highlights

Throughout his career, Juei-kuo Wu has focused on advancing technologies in the semiconductor industry. His work has been instrumental in developing methods that enhance the reliability and efficiency of integrated circuits. With a patent count of 1 patent, he continues to contribute to the field through his research and innovations.

Collaborations

Juei-kuo Wu has collaborated with notable colleagues, including Kuen-Chu Chen and Weng-Yi Chen. These collaborations have fostered a productive environment for innovation and have led to advancements in IC fabrication techniques.

Conclusion

Juei-kuo Wu's contributions to integrated circuit fabrication demonstrate his commitment to innovation in the semiconductor industry. His patented methods are paving the way for more efficient electronic devices.