Judith Ann Schmit

Title: Judith Ann Schmit: Innovator in Semiconductor Wafer Polishing

Introduction

Judith Ann Schmit is a notable inventor based in St. Peters, Missouri. She has made significant contributions to the field of semiconductor technology, particularly in the method of polishing semiconductor wafers. Her innovative approach has led to the development of a patented method that enhances the efficiency and effectiveness of wafer polishing.

Latest Patents

Judith holds a patent for a "Method of polishing a semiconductor wafer." This method involves polishing at least one of the surfaces and the notch of the wafer using a polishing pad and slurry. The process includes cleaning at least one surface of the wafer of residual slurry. After cleaning, the surface is grasped by applying a vacuum using a vacuum chuck. The edge of the wafer is then polished while it is held securely by the vacuum chuck.

Career Highlights

Judith is associated with Memc Electronic Materials, Inc., where she has applied her expertise in semiconductor materials. Her work has contributed to advancements in the manufacturing processes of semiconductor wafers, which are critical components in electronic devices.

Collaborations

Throughout her career, Judith has collaborated with notable colleagues, including Henry Frank Erk and Roland R Vandamme. These collaborations have fostered innovation and have played a role in the development of new technologies in the semiconductor industry.

Conclusion

Judith Ann Schmit's contributions to semiconductor wafer polishing exemplify her innovative spirit and dedication to advancing technology. Her patent and work at Memc Electronic Materials, Inc. highlight her impact on the industry.