Suwon, South Korea

Jubok Lee

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jubok Lee. Retrieved from https://idiyas.com/inventor/jubok-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jubok Lee and Semiconductor Inspection Technology.

Introduction

Jubok Lee is an inventor based in Suwon, South Korea, and is associated with Samsung Electronics Co., Ltd. His patent work concerns inspection technology for semiconductor devices.

Latest Patents

Lee is credited with 1 patent: “Inspection Apparatus for Semiconductor Device.” The invention describes an apparatus with a chamber and a substrate stage that holds a test wafer containing multiple wiring layers. A milling device partially removes material from the wafer, while a measuring device directs light onto it and uses a polarization camera to scan the reflected light. The apparatus measures the reflected light’s polarization characteristics and assesses wafer uniformity.

Career Highlights

Lee’s listed patent highlights work on semiconductor inspection, combining wafer preparation with optical measurement. The design is intended to examine test wafers and evaluate their uniformity.

Collaborations

Lee’s listed coworkers include Soonyang Kwon and Kwangrak Kim. The patent information provided does not specify their roles or contributions to this invention.

Conclusion

Jubok Lee’s patent reflects an approach to semiconductor inspection that integrates partial wafer milling with polarization-based optical measurement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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