Company Filing History:
Years Active: 2009
Title: Innovations by Juan E Dominquez in Atomic Layer Deposition
Introduction
Juan E Dominquez is an accomplished inventor based in Hillsboro, OR (US). He has made significant contributions to the field of atomic layer deposition (ALD) through his innovative methods and systems. His work is particularly relevant in the development of advanced materials for electronic devices.
Latest Patents
Juan E Dominquez holds 1 patent for his invention titled "Direct tailoring of the composition and density of ALD films." This patent describes a method that involves introducing an organometallic precursor under specific conditions in the presence of a substrate. The process includes forming a layer comprising a moiety of the organometallic precursor on the substrate through atomic layer deposition. This invention enhances the precision and control over the properties of ALD films, which are crucial for various applications in electronics.
Career Highlights
Juan is currently employed at Intel Corporation, where he applies his expertise in materials science and engineering. His work at Intel focuses on developing cutting-edge technologies that drive innovation in semiconductor manufacturing. His contributions have been instrumental in advancing the capabilities of electronic devices.
Collaborations
Juan has collaborated with notable colleagues such as Adrien Lavoie and Harsono S Simka. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of innovative solutions in the field of atomic layer deposition.
Conclusion
Juan E Dominquez is a prominent inventor whose work in atomic layer deposition has the potential to revolutionize the electronics industry. His innovative methods and dedication to advancing technology continue to make a significant impact.