Asan, South Korea

Ju Sik Jo

This inventor holds 1 USPTO granted patent. Top assignee: Daifuku Co., Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ju Sik Jo. Retrieved from https://idiyas.com/inventor/ju-sik-jo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Ju Sik Jo: Innovator in Wafer Stocking Technology

Introduction

Ju Sik Jo is a notable inventor based in Asan, South Korea. He has made significant contributions to the field of wafer stocking technology, showcasing his innovative spirit through his patented inventions. His work is particularly relevant in industries that require precise handling and storage of wafers.

Latest Patents

Ju Sik Jo holds a patent for an "Apparatus of inhalation type for stocking wafer at ceiling and inhaling type wafer stocking system having the same." This invention provides a unique solution for stocking wafers at a ceiling level, utilizing a shelf that supports a container holding the wafer. Additionally, it features an inhalation assembly designed to inhale gas that may leak from the container, ensuring a safe and efficient stocking process.

Career Highlights

Throughout his career, Ju Sik Jo has been associated with Daifuku Co., Ltd., a company known for its advanced material handling systems. His role at Daifuku has allowed him to apply his innovative ideas in practical settings, contributing to the company's reputation for excellence in technology.

Collaborations

Ju Sik Jo has worked alongside talented colleagues, including Jung Young Lee and Ho Geun Lee. Their collaborative efforts have likely enhanced the development and implementation of innovative solutions within their projects.

Conclusion

Ju Sik Jo's contributions to wafer stocking technology exemplify the impact of innovation in industrial applications. His patented inventions and collaborative work continue to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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