Keelung, Taiwan

Ju-Long Lee


Average Co-Inventor Count = 3.1

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2000-2001

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2 patents (USPTO):Explore Patents

Title: Innovations by Inventor Ju-Long Lee

Introduction

Ju-Long Lee is a notable inventor based in Keelung, Taiwan. He has made significant contributions to the field of exhaust gas treatment, particularly in semiconductor manufacturing processes. With a total of two patents to his name, his work focuses on improving the efficiency and effectiveness of exhaust treatment systems.

Latest Patents

Ju-Long Lee's latest patents include an "Exhaust Gas Treatment Apparatus Including a Water Vortex Means and a Discharge Pipe" and an "Exhaust Treatment Machine." The first patent describes an apparatus designed to treat exhaust gases generated during semiconductor manufacturing. It features a main pipe that transforms exhaust gases into waste powder, which is then discharged through a U pipe and a discharge pipe. The design incorporates gas and water vortex means to ensure smooth and efficient discharge of waste powder, preventing blockages. The second patent outlines an exhaust treatment machine that includes a burning chamber and a wet chamber. Water is injected into the wet chamber, where rotor blades create a vortex flow to flush away products from the burning chamber, effectively resolving issues related to drainpipe blockages.

Career Highlights

Throughout his career, Ju-Long Lee has worked with prominent companies in the semiconductor industry, including United Microelectronics Corporation and Utek Semiconductor Corporation. His experience in these organizations has contributed to his expertise in developing innovative exhaust treatment solutions.

Collaborations

Ju-Long Lee has collaborated with several professionals in his field, including Hunter Chung and Chung Ping-Chung. These collaborations have likely enhanced his research and development efforts, leading to the successful creation of his patented technologies.

Conclusion

Ju-Long Lee's contributions to exhaust gas treatment technology demonstrate his commitment to innovation in the semiconductor industry. His patents reflect a deep understanding of the challenges faced in this field and offer effective solutions to improve operational efficiency.

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