United Microelectronics Corp.

Utek Semiconductor Corporation

Ju-Long Lee

Hunter Chung

Jing-Yi Huang

Chi-Hsien Chen

Lu Tsung-Lin

Chien-Feng Chen

Chung Ping-Chung

An exhaust gas treatment apparatus for treating exhaust gas generated in semiconductor manufacturing processes. It includes a main pipe, a gas vortex means, a water vortex means, an U pipe and a discharge pipe. The main pipe transforms the exhaust gases to waste powder which are discharged out through the U pipe and the discharge pipe. The gas vortex means and water vortex means are located below the main pipe for generating annular and even downward gas flow and water flow at the outlet of the main pipe for preventing reflux of waste powder from entering into the main pipe. Waste powder thus won't deposit around the outlet. Scraper in the main pipe won't be stuck or deformed. Waste powder may be discharged out through the U pipe and discharge pipe smoothly and efficiently.

Exhaust gas treatment apparatus including a water vortex means and a discharge pipe

An exhaust treatment machine. The exhaust treatment machine has a burning chamber and a wet chamber. Water is injected into the wet chamber by a water inlet at a bottom portion of the wet chamber. At least two rotor blades are installed over the bottom of the wet chamber to generate a vortex flow of the water. Thus, the vortex flow of the water acentrically flushes away the product produced in the burning chamber and removes it via a drainpipe. Furthermore, those clots agglomerated from the powers produced in the burning chamber are fragmented by the rotor blades. The problems of blocking the drainpipe is thus resolved.

Exhaust treatment machine

Growing community of inventors

Keelung, Taiwan

Ju-Long Lee