Company Filing History:
Years Active: 2021-2023
Title: Ju Jin An: Innovator in Air Gap Structures
Introduction
Ju Jin An is a notable inventor based in Fishkill, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of air gap structures. With a total of 2 patents, his work has implications for improving the performance and efficiency of electronic devices.
Latest Patents
Ju Jin An's latest patents include innovative methods for forming air gap structures with dual dielectric layers. The first patent describes a method to create an air gap structure by forming an opening in a first dielectric layer between adjacent conductors. A first dielectric layer is then formed over the opening to fill a portion of it, while the remainder remains free of this layer. A second dielectric layer is placed on top of the first, leaving an air gap structure below. The second dielectric layer is devoid of wiring, allowing for enhanced performance.
The second patent focuses on a dual dielectric layer designed to close seams in air gap structures. This structure includes an opening in a first dielectric layer and a non-conformal dielectric layer over the opening. Depending on the design, this layer may either narrow or seal the end portion of the opening. Additionally, a conformal dielectric layer may be applied to further enhance the sealing of the air gap structure.
Career Highlights
Ju Jin An is currently employed at GlobalFoundries U.S. Inc., where he continues to push the boundaries of semiconductor technology. His work is instrumental in advancing the capabilities of modern electronics, making them more efficient and reliable.
Collaborations
Throughout his career, Ju Jin An has collaborated with talented individuals such as Vincent James McGahay and Craig R Gruszecki. These collaborations have fostered innovation and contributed to the successful development of his patented technologies.
Conclusion
Ju Jin An's contributions to the field of semiconductor technology, particularly in air gap structures, highlight his role as an influential inventor. His patents reflect a commitment to innovation and excellence in the industry.
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