Ju Hyuk Park

Title: Innovations of Ju Hyuk Park

Introduction

Ju Hyuk Park is a notable inventor based in Asan-si, South Korea. He has made significant contributions to the field of substrate processing technology. With a total of 3 patents to his name, his work focuses on enhancing the efficiency and stability of substrate processing methods.

Latest Patents

Ju Hyuk Park's latest patents include a substrate supporting apparatus and a substrate processing apparatus that incorporates advanced techniques for thin film deposition. One of his key innovations is a substrate processing method that ensures stable loading of a substrate, regardless of pressure variations in the reaction space. This method involves supplying an inert gas and forming a thin film by sequentially and repeatedly supplying a source gas, a reaction gas, and activating the reaction gas. The design features a separate space between the center portion of the substrate and the susceptor, allowing for effective communication between the reaction space and the separate space through multiple channels. The introduction of inert gas during the process prevents pressure imbalances, thereby improving the thin film deposition process.

Career Highlights

Ju Hyuk Park is currently employed at Asm IP Holding B.V., where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing substrate processing techniques, which are crucial for the semiconductor industry.

Collaborations

He has collaborated with notable colleagues, including Seung Hwan Lee and Sang Jin Jeong, contributing to various projects that enhance substrate processing technologies.

Conclusion

Ju Hyuk Park's contributions to substrate processing technology reflect his commitment to innovation and excellence in the field. His patents demonstrate a deep understanding of the complexities involved in semiconductor manufacturing processes.