Suwon, South Korea

Ju-Hyuk Chung

This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2003-2005.


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2003-2005

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2 patents (USPTO):Explore Patents

Title: Ju-Hyuk Chung: Innovator in Semiconductor Technology

Introduction

Ju-Hyuk Chung is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to enhancing semiconductor devices.

Latest Patents

One of his latest patents is titled "Inter-metal dielectric patterns and method of forming the same." This invention provides an inter-metal dielectric pattern that includes a lower interconnection on a semiconductor substrate, along with a lower dielectric layer featuring a via hole. The method involves forming an inter-metal dielectric layer that is patterned to create a via hole, exposing the lower interconnection. The materials used in this invention include low k-dielectric layers such as SiO, SiOF, SiOC, and porous dielectric.

Another notable patent is the "Method for manufacturing a semiconductor device having a metal-insulator-metal capacitor and a damascene wiring layer structure." This method outlines the process of creating a semiconductor device with a MIM capacitor and a damascene wiring layer structure. It details the formation of metal wiring layers and dielectric layers, culminating in the creation of a damascene structure that contacts the upper electrode.

Career Highlights

Ju-Hyuk Chung is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing advanced manufacturing techniques that enhance the performance and efficiency of semiconductor devices.

Collaborations

Throughout his career, Ju-Hyuk Chung has collaborated with notable colleagues, including Il-Goo Kim and Kyoung-woo Lee. These collaborations have fostered a creative environment that has led to innovative solutions in semiconductor technology.

Conclusion

Ju-Hyuk Chung's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a key innovator in the field. His advancements continue to influence the development of more efficient and effective semiconductor devices.

Profile summary based on public USPTO records.
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