Ju Hwan Jeong

Title: Innovations of Ju Hwan Jeong in Thin Film Technology

Introduction

Ju Hwan Jeong is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of thin film technology, holding two patents that showcase his innovative methods. His work focuses on enhancing the efficiency and selectivity of thin film formation processes.

Latest Patents

Ju Hwan Jeong's latest patents include a method for areal selective forming of thin film. This method involves several steps, including substrate preparation, precursor supply, purging, and thin film formation. The process utilizes a Group 5 metal precursor compound to achieve precise thin film applications. Another significant patent is the area-selective method for forming thin film by using nuclear growth retardation. This method incorporates a nuclear growth retardant to selectively adsorb to non-growth regions of the substrate, allowing for targeted thin film formation.

Career Highlights

Ju Hwan Jeong is currently employed at Egtm Co., Ltd., where he continues to develop and refine his innovative techniques in thin film technology. His work has positioned him as a key figure in the advancement of materials science.

Collaborations

Ju Hwan Jeong collaborates with talented coworkers, including Ha Na Kim and Woong Jin Choi. Their combined expertise contributes to the success of their projects and the advancement of their research.

Conclusion

Ju Hwan Jeong's contributions to thin film technology through his innovative patents demonstrate his commitment to advancing the field. His work at Egtm Co., Ltd. and collaborations with skilled colleagues further enhance the impact of his inventions.