This inventor holds 2 USPTO granted patents. Top assignees: Altasens, Inc., United Microelectronics Corp.. Active years: 2009-2010.
Company Filing History:


Years Active: 2009-2010
Title: Ju-Hsin Yen: Innovator in Image Sensor Technology
Introduction
Ju-Hsin Yen is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of image sensor technology, holding a total of 2 patents. His innovative work has paved the way for advancements in imaging systems.
Latest Patents
Ju-Hsin Yen's latest patents focus on the development of advanced image sensors. The first patent describes an image sensor where a planarized layer is formed on a semiconductor substrate that includes a pixel array region, an optical black region, and a logic region. This design covers a photo sensing unit array in the pixel array region. A patterned metal layer is created on the planarized layer corresponding to the pixel array and logic regions, while leaving the optical black region untouched. An optical black layer is then formed in the optical black region after a passivation layer is applied and before a color filter array is created at a temperature below 400°C, preferably containing metal material. The second patent outlines a similar image sensor and method of manufacturing, emphasizing the importance of the planarized layer and the structured formation of the optical black layer.
Career Highlights
Throughout his career, Ju-Hsin Yen has worked with notable companies in the semiconductor industry. He has been associated with United Microelectronics Corporation and Altasens, Inc., where he has contributed to various projects and innovations in image sensor technology.
Collaborations
Ju-Hsin Yen has collaborated with several professionals in his field, including Tzeng-Fei Wen and Giuseppe Rossi. These collaborations have further enhanced his work and contributed to the development of cutting-edge technologies.
Conclusion
Ju-Hsin Yen's contributions to image sensor technology demonstrate his innovative spirit and dedication to advancing the field. His patents reflect a deep understanding of semiconductor design and manufacturing processes. His work continues to influence the industry and inspire future innovations.