Ju-Don T Pan

Title: Ju-Don T Pan: Innovator in Electrical Interconnect Technology

Introduction

Ju-Don T Pan is a prominent inventor based in Austin, TX, known for his significant contributions to the field of electrical interconnect technology. With a total of 6 patents to his name, he has made remarkable advancements that enhance the efficiency and functionality of electronic devices.

Latest Patents

Among his latest patents is the innovative method titled "Rework of polymeric dielectric electrical interconnect by laser." This invention involves a metal/polymeric dielectric substrate where metal conductors are selectively disconnected by photoablating the polymeric dielectric with an excimer laser. The process etches the exposed metal using the polymeric dielectric as a mask, eliminating the need for a separate photoablatable mask. Siloxane-modified polyimide is identified as a preferred photoablatable polymeric material, while copper is the preferred metal used in this technology.

Another notable patent is the "Method of making an electrical multilayer interconnect." This method allows for the protection of electrical lines with an overcoat. It includes several steps, such as depositing an electrically conductive layer on a substrate, forming a base plating mask, and plating a copper base into an opening in the mask. The process also involves stripping the base plating mask and forming a pillar plating mask on top of the copper base, followed by plating an electrically conductive metal pillar.

Career Highlights

Ju-Don T Pan is currently associated with the Microelectronics and Computer Technology Corporation, where he continues to innovate and develop new technologies. His work has significantly impacted the field of microelectronics, particularly in enhancing the reliability and performance of electrical interconnects.

Collaborations

Throughout his career, Ju-Don has collaborated with notable colleagues, including Laurence D Schultz and John W Curry, II. These collaborations have fostered a creative environment that has led to groundbreaking advancements in their respective fields.

Conclusion

Ju-Don T Pan's contributions to electrical interconnect technology exemplify the spirit of innovation. His patents reflect a commitment to improving electronic systems, making him a key figure in the advancement of microelectronics.