Location History:
- Hsin-chu, TW (2015)
- Hsin-chu-shi, TW (2018)
Company Filing History:
Years Active: 2015-2018
Title: Ju-Chia Hsieh: Innovator in Plasma Processing Technology
Introduction
Ju-Chia Hsieh is a prominent inventor based in Hsin-chu-shi, Taiwan. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on advanced methods and apparatuses that enhance the efficiency and effectiveness of plasma processing.
Latest Patents
Hsieh's latest patents include innovative methods for plasma processing that involve intricate etching and reduction processes. One of his patents describes a plasma processing method that performs an etching process by supplying a fluorine-containing gas into a plasma processing space. This method etches a target substrate, forming a silicon oxide film or a silicon nitride film on a surface of a metal silicide film. Following the etching process, a reduction process is performed by supplying a hydrogen-containing gas, which reduces a metal-containing material deposited on a member facing the plasma processing space. Finally, a removal process is conducted by supplying an oxygen-containing gas to remove the metal obtained from the reduction process.
Another patent outlines a similar plasma processing method, but it focuses on a nickel silicide film instead. The etching, reduction, and removal processes are executed in a comparable manner, showcasing Hsieh's expertise in optimizing plasma processing techniques.
Career Highlights
Ju-Chia Hsieh is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His role involves developing cutting-edge plasma processing technologies that are crucial for modern electronics fabrication. Hsieh's innovative approaches have positioned him as a key figure in advancing semiconductor manufacturing processes.
Collaborations
Hsieh has collaborated with notable colleagues, including Akitoshi Harada and Yen-Ting Lin. These collaborations have fostered a dynamic environment for innovation and have contributed to the successful development of new technologies in plasma processing.
Conclusion
Ju-Chia Hsieh's contributions to plasma processing technology reflect his dedication to innovation and excellence in the field. His patents and work at Tokyo Electron Limited underscore his role as a significant inventor in the semiconductor industry.