This inventor holds 2 USPTO granted patents. Top assignees: Foxconn Technology Co., Ltd., Furui Precise Component (Kunshan) Co., Ltd.. Active years: 2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2011
Title: Jr-Shiun Chen: Innovator in Cooling Fan Technology
Introduction
Jr-Shiun Chen is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of cooling fan technology, holding a total of 2 patents. His innovative designs have enhanced the efficiency and functionality of electronic devices.
Latest Patents
Jr-Shiun Chen's latest patents include a cooling fan and a portable electronic device incorporating a centrifugal blower. The cooling fan patent describes a fan housing that includes a stator mounted within it. The stator features a core, an insulating frame, and stator coils that are wound around the core. This design ensures electrical insulation between the coils and the core, enhancing safety and performance. The portable electronic device patent outlines a casing that houses a centrifugal blower, which is designed to optimize airflow within the device. The impeller of the blower is engineered with blades that have varying heights, allowing for efficient air movement.
Career Highlights
Throughout his career, Jr-Shiun Chen has worked with prominent companies such as Foxconn Technology Co., Ltd. and Furui Precise Component (Kunshan) Co., Ltd. His experience in these organizations has contributed to his expertise in developing innovative cooling solutions.
Collaborations
Jr-Shiun Chen has collaborated with talented individuals in the industry, including Ching-Bai Hwang and Zhi-Hui Zhao. These partnerships have fostered a creative environment that has led to the development of cutting-edge technologies.
Conclusion
Jr-Shiun Chen's contributions to cooling fan technology and his innovative patents reflect his dedication to advancing electronic device efficiency. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile