Jouko Lång

Title: Jouko Lång: Innovator in Optoelectronics

Introduction

Jouko Lång is a notable inventor based in Lieto, Finland. He has made significant contributions to the field of optoelectronics, holding a total of 3 patents. His work focuses on advanced technologies that enhance the performance and quality of optoelectronic devices.

Latest Patents

One of Jouko Lång's latest patents is an optoelectronic device that includes a substrate layer with a first and second surface plane. This device features a mesa structure on the first surface plane, which consists of at least one layer of material. The first surface of the mesa structure is arranged at an angle α, which is neither 0° nor 180°. Additionally, the device incorporates a first terminating oxide layer that is applied after cleaning the mesa structure's surface to remove at least 75% of native oxides. Another significant patent involves a method and apparatus for processing thin films on substrates. This innovation allows for the growth of high-quality thin film layers using Atomic Layer Deposition (ALD) by preparing the substrate surface and creating an improved interface layer prior to the ALD growth, all within a single processing equipment.

Career Highlights

Throughout his career, Jouko Lång has worked with several prominent companies, including Comptek Solutions Oy and Microsoft Technology Licensing, LLC. His experience in these organizations has contributed to his expertise in the field of optoelectronics and thin film technology.

Collaborations

Jouko has collaborated with notable professionals in his field, including Vicente Calvo Alonso and Marjukka Tuominen. These collaborations have further enriched his work and innovations.

Conclusion

Jouko Lång is a distinguished inventor whose contributions to optoelectronics and thin film technology have made a significant impact. His patents reflect his commitment to advancing technology in these areas.