Haifa, Israel

Joseph Statlender

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2004.


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 32(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Joseph Statlender: Innovator in Plasma Treatment Technology

Introduction

Joseph Statlender is a notable inventor based in Haifa, Israel. He has made significant contributions to the field of plasma treatment technology, particularly in the processing of gases. His innovative work has implications for various industries, including semiconductor manufacturing.

Latest Patents

Statlender holds a patent for a method titled "Plasma treatment of processing gases." This invention features a dielectric barrier discharge (DBD) cell that includes ring-shaped electrodes positioned side-by-side on a dielectric tube. The design incorporates an AC power supply, allowing the cell to function as a DBD treatment device for the abatement of noxious gases, such as fluorocarbons (FCs) that may be emitted from semiconductor fabrication devices. The invention also allows for the inclusion of sensors and gas addition ports within the DBD cell. Multiple DBD cells can be combined to create a DBD reactor, enhancing the efficiency of the gas treatment process.

Career Highlights

Joseph Statlender is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has allowed him to further develop his innovative ideas and contribute to advancements in technology.

Collaborations

Throughout his career, Statlender has collaborated with talented individuals such as Avner Rosenberg and Stela Diamant Lazarovich. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Joseph Statlender's contributions to plasma treatment technology exemplify the impact of innovation in addressing environmental challenges. His work continues to influence the semiconductor industry and beyond.

Profile summary based on public USPTO records.
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