Philadelphia, PA, United States of America

Joseph Letizia


Average Co-Inventor Count = 6.2

ph-index = 2

Forward Citations = 40(Granted Patents)


Location History:

  • Evanston, IL (US) (2009)
  • Philadelphia, PA (US) (2010 - 2013)

Company Filing History:


Years Active: 2009-2013

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4 patents (USPTO):Explore Patents

Title: Joseph Letizia: Innovator in Chemical Mechanical Polishing

Introduction

Joseph Letizia is a prominent inventor based in Philadelphia, PA (US). He has made significant contributions to the field of chemical mechanical polishing, particularly in the semiconductor industry. With a total of 4 patents to his name, Letizia's work focuses on developing advanced polishing compositions that enhance the performance and efficiency of semiconductor manufacturing.

Latest Patents

Letizia's latest patents include innovative formulations for chemical mechanical polishing compositions. One notable patent is for a "Stable, concentratable, water soluble cellulose free chemical mechanical polishing composition." This composition is designed for polishing semiconductor wafers containing interconnect metals. It includes components such as water, an azole inhibitor, an alkali metal organic surfactant, and various optional additives to optimize performance. Another significant patent is for a "Stable, concentratable chemical mechanical polishing composition and methods relating thereto," which shares similar components and methods for effective polishing of semiconductor substrates.

Career Highlights

Throughout his career, Joseph Letizia has worked with esteemed institutions and companies. He has been associated with Northwestern University, where he contributed to research and development in materials science. Additionally, he has worked with Rohm and Haas Electronic Materials CMP Holdings, Inc., furthering advancements in chemical mechanical polishing technologies.

Collaborations

Letizia has collaborated with notable professionals in his field, including Tobin Jay Marks and Antonio Facchetti. These collaborations have enriched his research and contributed to the development of innovative solutions in semiconductor processing.

Conclusion

Joseph Letizia's contributions to the field of chemical mechanical polishing have established him as a key inventor in the semiconductor industry. His innovative patents and collaborations reflect his commitment to advancing technology in this critical area.

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