Company Filing History:
Years Active: 2014-2016
Title: Joseph Lee: Innovator in Semiconductor Laser Annealing
Introduction
Joseph Lee is a prominent inventor based in Castro Valley, CA. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to laser annealing processes.
Latest Patents
One of Joseph Lee's latest patents is focused on dual-loop control for laser annealing of semiconductor wafers. This patent discloses systems and methods for performing semiconductor laser annealing using dual loop control. The first control loop operates at a first frequency, managing the output of the laser while also controlling the 1/f laser noise. The second control loop regulates the output power of the laser and operates at a frequency lower than the first. This second loop measures the thermal emission of the wafer over an area the size of one or more die, allowing for the averaging out of within-die emissivity variations when determining the measured annealing temperature. The measured annealing temperature, along with an annealing temperature set point, is utilized to generate the control signal for the second control loop.
Career Highlights
Joseph Lee is currently employed at Ultratech, Inc., where he continues to develop innovative solutions in semiconductor technology. His work has positioned him as a key figure in advancing laser annealing techniques.
Collaborations
Throughout his career, Joseph has collaborated with notable coworkers such as James McWhirter and David Gaines. These collaborations have further enriched his contributions to the field.
Conclusion
Joseph Lee's work in semiconductor laser annealing exemplifies the spirit of innovation in technology. His patents and career achievements reflect his dedication to advancing the industry.