Dresden, Germany

Joseph L Petrucci, Jr

This inventor holds 1 USPTO granted patent. Top assignee: Freescale Semiconductor,inc.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joseph L Petrucci, Jr. Retrieved from https://idiyas.com/inventor/joseph-l-petrucci-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Joseph L Petrucci, Jr: Innovator in Semiconductor Technology

Introduction

Joseph L Petrucci, Jr. is a notable inventor based in Dresden, DE. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Joseph holds a patent for a semiconductor device and method of manufacture. This patent describes a manufacturing method where an emitter region and a base enhancement region are formed to provide linear voltage, capacitance, and low resistance characteristics. The semiconductor device is created on a silicon substrate layer with an epitaxial layer. Trenches are cut into the epitaxial layer and filled with oxide to reduce junction capacitance and base resistance. The emitter region and the base enhancement region are simultaneously formed through an anneal process.

Career Highlights

Joseph L Petrucci, Jr. is associated with Freescale Semiconductor, Inc., where he has applied his expertise in semiconductor manufacturing. His work has contributed to advancements in the efficiency and performance of semiconductor devices.

Collaborations

Throughout his career, Joseph has collaborated with notable colleagues, including John L Freeman, Jr. and Raymond J Balda. These collaborations have likely enhanced the innovation and development of semiconductor technologies.

Conclusion

Joseph L Petrucci, Jr. is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His contributions continue to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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