Company Filing History:
Years Active: 1995-1998
Title: Joseph Kava: Innovator in Plasma Etch Technology
Introduction
Joseph Kava is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of plasma etch technology, holding a total of 4 patents. His work focuses on improving the efficiency and effectiveness of plasma etch chambers, which are critical in semiconductor manufacturing.
Latest Patents
One of Joseph Kava's latest patents involves contaminant reduction improvements for plasma etch chambers. This innovative design includes a modified focus ring that works in conjunction with chamber pressure throttling to eject contaminants away from the substrate just before the etching cycle is completed. Additionally, process gas is directed against the inner wall of the chamber to create a swirling flow of plasma, which helps to disturb any contaminant-generating fields adjacent to the chamber wall. A process gas or a non-reactive purge gas may also be supplied from a diffuser atop the cathode, directing a gas layer along the top and sides of the chamber to reduce contaminant build-up on the chamber surfaces.
Career Highlights
Joseph Kava is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work has been instrumental in advancing the technology used in plasma etch chambers, contributing to more efficient manufacturing processes.
Collaborations
Throughout his career, Joseph has collaborated with notable colleagues, including Richard J. McGovern and Greg A. Blackburn. These collaborations have further enhanced the innovation and development of technologies in the semiconductor field.
Conclusion
Joseph Kava's contributions to plasma etch technology demonstrate his commitment to innovation and excellence in the semiconductor industry. His patents reflect a deep understanding of the challenges faced in manufacturing processes and provide effective solutions to enhance efficiency.