The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 1995
Filed:
Mar. 08, 1994
Applicant:
Inventors:
Joseph Kava, San Jose, CA (US);
Richard J McGovern, San Jose, CA (US);
Greg A Blackburn, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H / ;
U.S. Cl.
CPC ...
1566431 ; 156345 ; 216 67 ; 216 71 ; 1187 / ; 20429831 ;
Abstract
The invention is directed to a focus ring for surrounding a workpiece/surface substrate during plasma processing comprising a hollow annular assembly comprised of electrically insulating material and having a texturized surface. The texturized ring is preferably in the geometry of a generally cylindrical structure. The texturizing of the ring can be effected by any means of surface abrasion including bead blasting or chemical etching.