Webster, NY, United States of America

Joseph Jech, Jr

USPTO Granted Patents = 28 

Average Co-Inventor Count = 3.1

ph-index = 9

Forward Citations = 467(Granted Patents)


Location History:

  • Rochester, NY (US) (1990 - 2002)
  • Webster, NY (US) (2011 - 2014)

Company Filing History:


Years Active: 1990-2014

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28 patents (USPTO):Explore Patents

Title: Joseph Jech, Jr.: Innovator in Silicon Substrate Technologies

Introduction: Joseph Jech, Jr., an accomplished inventor based in Webster, NY, has showcased his ingenuity through an impressive portfolio of 28 patents. His work primarily revolves around advancements in silicon substrate fabrication and liquid dispensing technologies.

Latest Patents: Among his latest innovations is a patent for a method of etching silicon substrates. This method involves providing a silicon substrate with a first and second surface, etching grooves, and depositing a dielectric material. Additionally, he has developed a patent for a liquid dispenser that features multiple liquid return passages, effectively optimizing liquid flow between supply and return channels.

Career Highlights: Joseph Jech, Jr. has made significant contributions to the field while working with Eastman Kodak Company, a renowned organization known for its innovations in imaging and technology. His expertise in silicon substrate technologies has set benchmarks in the industry.

Collaborations: Throughout his career, Jech has collaborated with talented colleagues such as Yonglin Xie and Qing Yang. Together, they have worked on innovative solutions that drive further advancements in their respective fields.

Conclusion: Joseph Jech, Jr. stands out as a prominent inventor whose contributions continue to shape the landscape of technology in the areas of silicon substrates and liquid dispensing systems. His ongoing pursuit of innovation exemplifies the spirit of creativity and practical problem-solving in engineering.

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