Joseph James Vegh

Title: Joseph James Vegh: Semiconductor Etch Process Inventor.

Introduction

Joseph James Vegh is an inventor based in Fremont, California, whose work focuses on semiconductor etching processes. He is associated with Lam Research Corporation and is named on 2 patents.

Latest Patents

Vegh’s listed patents address techniques for improving precision and stability during the etching of semiconductor structures.

“Sulfur and Fluorine Containing Etch Chemistry for Improvement of Distortion and Bow Control for HAR Etch” describes a method for etching features through alternating layers in a stack. The process uses a plasma formed from an etching gas containing sulfur- and fluorine-based molecules, with the aim of improving distortion and bow control during high-aspect-ratio etching.

“Method for Etching with Controlled Wiggling” describes treating a patterned organic mask with a plasma generated from a gas containing hydrogen and nitrogen. The treatment is intended to make the mask more resistant to wiggling before trenches are etched through it into the underlying etch layer.

Career Highlights

Vegh’s patent work reflects contributions to semiconductor manufacturing, particularly in etch chemistry, mask stability, and the formation of fine features in layered materials. His listed company affiliation is Lam Research Corporation.

Collaborations

Kyeong-Koo Chi and Sanghyuk Choi are identified as Vegh’s coworkers. Their names also appear in connection with his collaborative patent work.

Conclusion

Joseph James Vegh’s patents focus on improving control and reliability in semiconductor etching, including high-aspect-ratio feature formation and mask stability.