The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2014
Filed:
Sep. 24, 2012
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Joseph J. Vegh, Fremont, CA (US);
Yungho Noh, Hwaseong, KR;
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for etching trenches in an etch layer disposed below a patterned organic mask is provided. The patterned organic mask is treated, comprising flowing a treatment gas comprising Hand N, forming a plasma from the treatment gas, making patterned organic mask more resistant to wiggling, and stopping the flow of the treatment gas. Trenches are etched in the etch layer through the patterned organic mask.
Vegh, Joseph. (2014). Method for etching with controlled wiggling (U.S. Patent No. 8828744). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8828744
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile