This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 2005.
Company Filing History:
Years Active: 2005
Title: Joseph E. Shaver: Innovator in Lithographic Metrology
Introduction
Joseph E. Shaver is a notable inventor based in South Burlington, VT (US). He has made significant contributions to the field of lithography, particularly in the area of metrology for semiconductor manufacturing. With a total of 2 patents, his work has been instrumental in enhancing the precision of lithographic processes.
Latest Patents
Shaver's latest patents focus on "Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus." This innovative method employs three-dimensional feature metrology to implement critical image control and feedback for lithographic focus and x/y tilt. The technique measures three-dimensional profile changes in a photo-sensitive film and provides compensatory exposure tool focus corrections to maintain a stable lithographic process. The focus change from the optimal tool focus offset is monitored directly on critical product images for both contact hole and line images. Z focus corrections and x/y tilt corrections are fed back independently of dose to ensure critical dimension (CD) control, thereby improving semiconductor wafer printing. Additionally, this method can diagnose issues with the focusing system by measuring the relationship between line edge width and barometric pressure.
Career Highlights
Joseph E. Shaver is currently employed at International Business Machines Corporation (IBM), where he continues to push the boundaries of innovation in lithographic technology. His work has been pivotal in advancing the capabilities of semiconductor manufacturing processes.
Collaborations
Shaver has collaborated with several esteemed colleagues, including Reginald R. Bowley, Jr. and Vincent J. Carlos. Their combined expertise has contributed to the successful development of advanced metrology techniques.
Conclusion
Joseph E. Shaver's contributions to lithographic metrology have significantly impacted the semiconductor industry. His innovative methods and collaborative efforts continue to drive advancements in this critical field.