Joseph C Langston

Title: Innovations of Joseph C. Langston

Introduction

Joseph C. Langston is a notable inventor based in Los Altos, California. He has made significant contributions to the field of photolithography, holding a total of four patents. His work primarily focuses on techniques that enhance the precision and efficiency of photolithographic processes.

Latest Patents

Langston's latest patents include a method for multiple reduction photolithography. This innovative technique allows for the creation of very small line dimensions by utilizing a mask exposed through a reticle in a reduction photolithography exposure tool. The process involves placing the fabricated mask in a second exposure tool to expose a wafer substrate, resulting in a patterned substrate with critical dimensions that are significantly smaller than the original reticle. Another notable patent involves using thin films as an etch stop in the EUV mask fabrication process. This method describes a silicon-substrate based reflective photolithographic mask fabrication technique that incorporates a multilayer substrate and a thin layer of silicon dioxide to enhance the etching process.

Career Highlights

Joseph C. Langston is currently employed at Intel Corporation, where he continues to innovate in the field of photolithography. His work has been instrumental in advancing the capabilities of photolithographic techniques, which are crucial for semiconductor manufacturing.

Collaborations

Langston has collaborated with esteemed colleagues such as Pei-yang Yan and Guojing Zhang. Their combined expertise has contributed to the development of advanced photolithographic methods.

Conclusion

Joseph C. Langston's contributions to photolithography demonstrate his commitment to innovation in the semiconductor industry. His patents reflect a deep understanding of the complexities involved in creating precise photolithographic patterns.