Charlotte, VT, United States of America

Josef W Korejwa


Average Co-Inventor Count = 3.9

ph-index = 3

Forward Citations = 122(Granted Patents)


Location History:

  • Shelburne, VT (US) (1995)
  • Charlotte, VT (US) (2001 - 2002)

Company Filing History:


Years Active: 1995-2002

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Inventor Profile: Josef W Korejwa

Introduction

Josef W Korejwa is an accomplished inventor based in Charlotte, Vermont, USA. With a total of four patents to his name, he has made significant contributions to the field of electroplating processes, particularly in applications relevant to semiconductor technology. His innovative methods and apparatuses reflect a commitment to enhancing the efficiency and quality of electroplated surfaces.

Latest Patents

Josef's latest patents showcase his expertise and creativity in the realm of electroplating. The first patent details a multi-step potentiostatic/galvanostatic plating control method and apparatus. This invention provides a solution for the electroplating of substrates, such as semiconductor wafers, ensuring uniform surfaces while minimizing bum-through of seed layers. The method employs a defined multistep electroplating process that alternates between applying a low voltage and ramping up preprogrammed current values.

Additionally, his patent on electroplating apparatus and methods using a compressible contact outlines a metal plating apparatus featuring a compressible member with a conductive surface. This innovative approach allows for the plating current to be transmitted over a wider area of the substrate, enhancing plating efficiency. The compressible member is designed to absorb plating solution, facilitating optimal transfer to the substrate.

Career Highlights

Currently, Josef W Korejwa is associated with the renowned International Business Machines Corporation (IBM), where he continues to develop cutting-edge technologies in the field of electroplating. His work at IBM places him at the forefront of technological advancements in semiconductor fabrication, where precision and quality are paramount.

Collaborations

Throughout his career, Josef has collaborated with several notable professionals, including Erick G Walton and Dean S Chung. These partnerships exemplify the collaborative spirit vital to innovation in technology and highlight the importance of teamwork in advancing scientific research.

Conclusion

Josef W Korejwa's contributions to electroplating technology and his involvement with leading companies like IBM mark him as a significant figure in the field of inventions related to semiconductor processing. His patents not only demonstrate his innovative mindset but also reflect the ongoing advancements in the industry that benefit from his expertise. As the landscape of technology continues to evolve, inventors like Josef play a crucial role in shaping the future of electroplating and semiconductor fabrication.

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