Jori Selen

Title: Jori Selen: Innovator in Lithographic Technology

Introduction

Jori Selen is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of lithography, particularly in substrate level sensing technology. His innovative work has led to the development of a patent that enhances the precision of lithographic processes.

Latest Patents

Jori Selen holds a patent titled "Substrate level sensing in a lithographic apparatus." This invention involves a lithographic apparatus that includes a substrate table designed to support a substrate. The apparatus features actuators that can move the substrate table in a plane parallel to the substrate's surface. A projection system is included to pattern the substrate with fields aligned in a scanning exposure direction. The level sensor is capable of sensing the height of the substrate using multiple measurement spots. Additionally, a controller is responsible for managing the actuators to create strokes of relative movement between the substrate and the level sensor for mapping the substrate's height. These strokes are executed at an angle of less than 20 degrees relative to the scanning exposure direction. The patent also describes a method associated with mapping the height of a substrate.

Career Highlights

Jori Selen is currently employed at ASML Netherlands B.V., a leading company in the field of lithography and semiconductor manufacturing. His work at ASML has positioned him as a key player in advancing lithographic technology. With a focus on precision and innovation, Selen continues to contribute to the development of cutting-edge solutions in the industry.

Collaborations

Throughout his career, Jori has collaborated with talented individuals such as Doru Cristian Torumba and Marcel Bontekoe. These collaborations have fostered an environment of innovation and have led to significant advancements in their respective fields.

Conclusion

Jori Selen is a distinguished inventor whose work in lithographic technology has made a lasting impact. His patent on substrate level sensing demonstrates his commitment to enhancing precision in lithography. Through his role at ASML and collaborations with other experts, Selen continues to drive innovation in the industry.