Gyeonggi-do, South Korea

JoonYeon Cho

This inventor holds 1 USPTO granted patent. Top assignee: Merck Patent Gmbh. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: JoonYeon Cho. Retrieved from https://idiyas.com/inventor/joonyeon-cho-0bxvdrcj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: JoonYeon Cho: Innovator in Wafer Processing Technology

Introduction

JoonYeon Cho is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of wafer processing technology. His innovative work has led to the development of a unique rinse method that enhances the efficiency of semiconductor manufacturing.

Latest Patents

JoonYeon Cho holds 1 patent for his invention titled "Rinse and method of use thereof for removing edge protection layers and residual metal hardmask components." This patent discloses a rinse solution that includes acetic acid and/or a halogenated acetic acid, which is effective in removing edge protection layers and residual hardmask components from wafers or substrates.

Career Highlights

JoonYeon Cho is currently employed at Merck Patent GmbH, where he continues to advance his research and development efforts in semiconductor technologies. His work is pivotal in improving the processes involved in wafer fabrication.

Collaborations

He collaborates with talented individuals such as M Dalil Rahman and Salem Mullen, contributing to a dynamic team focused on innovation in the field.

Conclusion

JoonYeon Cho's contributions to wafer processing technology exemplify the impact of innovative thinking in the semiconductor industry. His patent reflects a commitment to enhancing manufacturing processes, which is crucial for the advancement of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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