Daejeon, South Korea

Joon-Ho You

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Intekplus Co., Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joon-Ho You. Retrieved from https://idiyas.com/inventor/joon-ho-you

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Joon-Ho You: Innovator in Three-Dimensional Shape Measurement

Introduction

Joon-Ho You is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of measurement technology, particularly with his innovative approach to three-dimensional shape measurement.

Latest Patents

Joon-Ho You holds a patent for a three-dimensional shape measuring apparatus. This apparatus includes a light source, a beam splitter to split illumination light, and a target object with a height difference. It also features a reference mirror, a light detecting element to capture interference patterns, and a control computer for image processing. Notably, the apparatus includes a subsidiary reference beam generating unit that alters the optical path to create a subsidiary reference beam.

Career Highlights

Joon-Ho You is associated with Intekplus Co., Ltd., where he continues to develop and refine his inventions. His work has garnered attention for its practical applications in various industries, enhancing the accuracy and efficiency of three-dimensional measurements.

Collaborations

Joon-Ho collaborates with talented colleagues, including MinGu Kang and Ssang-Gun Lim, who contribute to the innovative environment at Intekplus Co., Ltd.

Conclusion

Joon-Ho You's contributions to three-dimensional shape measurement technology exemplify the spirit of innovation. His patent and ongoing work at Intekplus Co., Ltd. highlight the importance of advancements in measurement technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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