Company Filing History:
Years Active: 2013
Title: Innovator Spotlight: Joon Ha Hwang from Gyeonggi-do, South Korea
Introduction: Joon Ha Hwang is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of abrasive materials, specifically in the development of chemical mechanical polishing slurries. With his innovative work, he has secured a patent that showcases his expertise and creativity in manufacturing processes.
Latest Patents: Joon Ha Hwang holds a patent for "Abrasive particles, method of manufacturing the abrasive particles, and method of manufacturing chemical mechanical polishing slurry." This invention discloses the composition of abrasive particles and outlines the method for their manufacture. The process includes preparing a raw material precursor, followed by drying and calcining it in a controlled gas atmosphere that is low in oxygen, as compared to air. This innovative approach enhances the quality of the finished CMP slurry, making it highly effective for various industrial applications.
Career Highlights: Hwang works at K.C. Tech Co., Ltd., where he utilizes his extensive knowledge and skills in material science to drive innovation in the field. His dedication to research and development has positioned him as a key figure in his company and the industry at large. His talent for identifying and solving complex problems has contributed to significant advancements in polishing technologies.
Collaborations: Joon Ha Hwang collaborates closely with his colleagues, including Suk Min Hong and Myung Won Suh. Their combined expertise and teamwork foster an environment of innovation and support the development of new products and technologies. Such collaborations are essential in maintaining a competitive edge in a rapidly evolving market.
Conclusion: Joon Ha Hwang represents the spirit of innovation in the materials industry. His patent for abrasive particles and CMP slurries highlights the importance of research and development in creating advanced manufacturing solutions. As he continues to collaborate with talented professionals, he is sure to further impact the field and inspire future inventors.