The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2013
Filed:
Dec. 27, 2008
Suk Min Hong, Gyeonggi-do, KR;
Myung Won Suh, Gyeonggi-do, KR;
Yong Kuk Kim, Gyeonggi-do, KR;
Joon Ha Hwang, Gyeonggi-do, KR;
Jeong Yun Kim, Seoul, KR;
Dong Hyun Kim, Seoul, KR;
Suk Min Hong, Gyeonggi-do, KR;
Myung Won Suh, Gyeonggi-do, KR;
Yong Kuk Kim, Gyeonggi-do, KR;
Joon Ha Hwang, Gyeonggi-do, KR;
Jeong Yun Kim, Seoul, KR;
Dong Hyun Kim, Seoul, KR;
K.C. Tech Co., Ltd., Gyeonggi-Do, KR;
Abstract
Disclosed are abrasive particles, a method for manufacturing the abrasive particles, and a method for manufacturing a Chemical Mechanical Polishing (CMP) slurry. The method for manufacturing abrasive particles for the CMP slurry includes preparing a raw material precursor, drying the raw material precursor, and calcining the dried raw material precursor using a calcination furnace where a gas atmosphere having relatively less oxygen in comparison with an air atmosphere is created.