This inventor holds 1 USPTO granted patent. Top assignees: Dongwoo Fine-Chem Co., Ltd., Samsung Display Co., Ltd.. Active years: 2022.
Company Filing History:
1 out of 382 
1 out of 27,287 
Years Active: 2022
Title: Joohwan Chung: Innovator in Thin Film Etchant Technology
Introduction
Joohwan Chung is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of thin film technology, particularly through his innovative patent that addresses challenges in metal pattern formation.
Latest Patents
Joohwan Chung holds a patent for a "Thin film etchant composition and method of forming metal pattern by using the same." This invention provides a thin film etchant composition designed to prevent the re-adsorption of etched metal while ensuring uniform etching of thin films. The composition includes approximately 43 wt % to 46 wt % of phosphoric acid, 5 wt % to 8 wt % of nitric acid, 10 wt % to 17 wt % of acetic acid, 1 wt % to 3 wt % of iron nitrate, 0.7 wt % to 1.5 wt % of phosphate, and deionized water as the remaining component based on the total weight of the composition. This innovative approach enhances the efficiency and effectiveness of metal pattern formation in various applications.
Career Highlights
Throughout his career, Joohwan Chung has worked with prominent companies in the technology sector. He has been associated with Samsung Display Co., Ltd. and Dongwoo Fine-Chem Co., Ltd., where he has contributed his expertise in thin film technologies and etchant compositions.
Collaborations
Joohwan Chung has collaborated with talented individuals in his field, including Jinhyung Kim and Jinsook Kim. These collaborations have likely fostered innovation and advancements in their respective projects.
Conclusion
Joohwan Chung's contributions to thin film etchant technology exemplify the importance of innovation in the field. His patent not only addresses critical challenges but also showcases his commitment to advancing technology in the industry.