Joo Won Han

Title: Innovations by Joo Won Han

Introduction

Joo Won Han is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of semiconductor processing, holding a total of 4 patents. His work primarily focuses on methods that enhance the efficiency and effectiveness of etch processing chambers.

Latest Patents

One of his latest patents is a method for in-situ chamber clean using carbon monoxide (CO) gas utilized in an etch processing chamber. This method relates to the removal of etch by-products from the plasma processing chamber using carbon monoxide or carbon dioxide. In this embodiment, the process involves exposing a chamber component to a cleaning gas mixture in the absence of a substrate, effectively cleaning residues that may include refractory metals or metal silicides.

Another significant patent involves methods for forming three-dimensional NAND structures atop a substrate. This method includes providing a substrate with alternating nitride and oxide layers, etching a photoresist layer, and using a specific process gas to create a plasma for etching through the layers. This innovative approach is crucial for advancing NAND technology.

Career Highlights

Joo Won Han is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to contribute to cutting-edge technologies that are essential for modern electronics.

Collaborations

He has collaborated with notable coworkers such as Sang Wook Kim and Kee Young Cho, further enhancing the innovative environment at Applied Materials.

Conclusion

Joo Won Han's contributions to semiconductor processing through his patents and work at Applied Materials, Inc. highlight his role as a key innovator in the field. His methods for improving etch processing and NAND structure formation are significant advancements that continue to influence the industry.