Seoul, South Korea

Joo Ho Kim

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Wonik Ips Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joo Ho Kim. Retrieved from https://idiyas.com/inventor/joo-ho-kim-xqitpc43

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Joo Ho Kim - Innovator in Substrate Processing Technology.

Introduction

Joo Ho Kim is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Joo Ho Kim holds a patent for a substrate processing apparatus. This invention relates to a substrate processing apparatus that includes a gas utility exhausting each of the reaction space and the protective space. The apparatus is designed to perform a pressure change process that includes both a high-pressure process, which is in a state of pressure higher than atmospheric pressure, and a low-pressure process that is in a state of pressure lower than atmospheric pressure. This technology is particularly beneficial for processing multiple substrates introduced into the reaction space.

Career Highlights

Joo Ho Kim is currently employed at Wonik IPS Co., Ltd., where he continues to innovate and develop new technologies in substrate processing. His work has been instrumental in advancing the capabilities of substrate processing systems.

Collaborations

Some of his notable coworkers include Seung Seob Lee and Jeong Lim Son. Their collaborative efforts contribute to the innovative environment at Wonik IPS Co., Ltd.

Conclusion

Joo Ho Kim is a key figure in the field of substrate processing technology, with a focus on enhancing processing efficiency through innovative apparatus design. His contributions are shaping the future of substrate processing in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…