This inventor holds 1 USPTO granted patent, plus 1 CIPO patent and 1 EPO patent. Top assignee: Konecranes Global Corporation. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: Jonna Nousiainen: Innovator in Runway Measurement Technology
Introduction
Jonna Nousiainen is a prominent inventor based in Hyvinkaa, Finland. She has made significant contributions to the field of measurement technology, particularly with her innovative runway measurement system. Her work exemplifies the intersection of engineering and practical application in aviation.
Latest Patents
Jonna holds a patent for a "Runway measurement system and method." This system includes a fixed measurement unit, a data processing unit, and a mobile unit. The mobile unit features a planar base, a reflector, and an elevation element that ensures accurate measurements by maintaining the spatial orientation of the base in relation to the surface. Additionally, the mobile unit is equipped with tilt measuring means to determine deviations and tilt elimination means to enhance measurement accuracy. This innovation is crucial for improving the safety and efficiency of runway operations.
Career Highlights
Jonna is currently employed at Konecranes Global Corporation, where she applies her expertise in measurement systems. Her role involves developing advanced technologies that enhance operational efficiency in various industries. With her background in engineering and innovation, she has become a valuable asset to her team.
Collaborations
Jonna collaborates with talented professionals such as Juha Sunio and Matti Pekkarinen. Their combined expertise fosters a creative environment that drives innovation and leads to the development of cutting-edge technologies.
Conclusion
Jonna Nousiainen's contributions to runway measurement technology highlight her role as a leading inventor in her field. Her innovative solutions continue to impact the aviation industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
