Seoul, South Korea

Jongil Weon

This inventor holds 1 USPTO granted patent. Top assignee: Sungkyunkwan University. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jongil Weon. Retrieved from https://idiyas.com/inventor/jongil-weon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2013

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Jongil Weon: Innovator in Scratch Testing Technology

Introduction

Jongil Weon is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of testing apparatuses, particularly with his innovative scratch testing technology. His work is recognized for its practical applications in various industries.

Latest Patents

Jongil Weon holds a patent for a "Scratch testing apparatus for performing scratching test while gradually increasing or decreasing load." This apparatus is designed to conduct scratching tests by gradually adjusting the pressure applied to a test specimen. The technology involves a head unit that moves horizontally, allowing for precise control over the load applied during testing. This innovation enhances the accuracy and reliability of scratch tests.

Career Highlights

Jongil Weon is affiliated with Sungkyunkwan University, where he contributes to research and development in engineering and materials science. His expertise in testing apparatuses has positioned him as a valuable asset in academic and industrial research.

Collaborations

Jongil Weon has collaborated with colleagues such as Hongsun Park and Changsung Seok. Their combined efforts in research have led to advancements in testing methodologies and applications.

Conclusion

Jongil Weon's contributions to scratch testing technology exemplify his innovative spirit and dedication to advancing engineering practices. His work continues to influence the field and inspire future developments in testing apparatuses.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…