Jong Yong Park

Title: Jong Yong Park: Innovator in Copper Clad Laminate Film Technology

Introduction

Jong Yong Park is a notable inventor based in Gyeongsangbuk-do, South Korea. He has made significant contributions to the field of materials science, particularly in the development of advanced copper clad laminate films. With a total of 2 patents to his name, Park continues to push the boundaries of innovation in electronic materials.

Latest Patents

His latest patents include a copper-clad laminate film and an electronic device that incorporates this innovative material. The first patent discloses a copper-clad laminate film that features a polyimide-based substrate with a fluorine layer on at least one side. This film also includes a tie-layer made from specific metal elements and a copper layer, designed to enhance performance and durability. The second patent similarly describes a copper-clad laminate film with a fluorine-containing substrate and a tie layer that may consist of a metal or metal alloy, emphasizing the importance of the metal-oxygen bond dissociation energy in its composition.

Career Highlights

Jong Yong Park is currently employed at Toray Advanced Materials Korea Inc., where he applies his expertise in materials science to develop cutting-edge technologies. His work has positioned him as a key player in the advancement of electronic materials, particularly in the realm of copper clad laminates.

Collaborations

Throughout his career, Park has collaborated with talented individuals such as Jong Hun Cheon and Ha Soo Lee. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Jong Yong Park's contributions to the field of copper clad laminate films exemplify his commitment to innovation and excellence. His patents reflect a deep understanding of materials science and a dedication to advancing technology in electronic devices.