Disan, South Korea

Jong Yeol Yang

This inventor holds 1 USPTO granted patent. Top assignee: Ulsan Chemical Co., Ltd.. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jong Yeol Yang. Retrieved from https://idiyas.com/inventor/jong-yeol-yang-yhd2daqh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2008

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of Jong Yeol Yang in Semiconductor Processes

Introduction

Jong Yeol Yang is a notable inventor based in Disan, South Korea. He has made significant contributions to the field of semiconductor processes, particularly through his innovative patent related to dry-etching gases.

Latest Patents

Yang holds a patent for a method titled "Dry-etching gas for semiconductor process and preparation method thereof." This invention focuses on the continuous preparation of highly pure octafluorocyclopentene, which is essential for dry-etching processes. The method involves reacting octachlorocyclopentene with KF in a continuous manner and purifying the resulting crude octafluorocyclopentene. The process is designed to ensure that the gaseous octafluorocyclopentene composition achieves a purity level of 99.995 vol % or higher, with minimal impurities.

Career Highlights

Jong Yeol Yang is currently employed at Ulsan Chemical Co., Ltd., where he continues to develop innovative solutions in the semiconductor industry. His work has been instrumental in advancing the efficiency and effectiveness of dry-etching processes.

Collaborations

Yang collaborates with talented coworkers, including Hae Seok Ji and Ook Jae Cho, who contribute to the innovative environment at Ulsan Chemical Co., Ltd.

Conclusion

Jong Yeol Yang's contributions to semiconductor processes through his patented methods highlight his role as a key innovator in the field. His work not only enhances the purity of essential gases but also supports advancements in semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…