This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2013.
Company Filing History:
Years Active: 2013
Title: Innovations by Jong I Shin in High-Temperature Etching
Introduction
Jong I Shin is an accomplished inventor based in Santa Clara, CA (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of high-temperature etching processes.
Latest Patents
Jong I Shin holds a patent for "Methods for high temperature etching a high-K material gate structure." This innovative method involves etching high-k material on a substrate by utilizing a plasma formed from an etching gas mixture that includes at least a halogen-containing gas. The process maintains the interior surface temperature of the etch chamber above 100 degrees Celsius while ensuring the substrate temperature remains between 100 degrees Celsius and 250 degrees Celsius during the etching process.
Career Highlights
Jong I Shin is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on advancing etching techniques that enhance the performance and efficiency of semiconductor devices.
Collaborations
Throughout his career, Jong has collaborated with notable colleagues, including Anh-Kiet Quang Phan and Meihua Shen. These collaborations have contributed to the development of innovative solutions in semiconductor technology.
Conclusion
Jong I Shin's contributions to high-temperature etching processes represent a significant advancement in semiconductor manufacturing. His innovative methods continue to influence the industry and pave the way for future developments.